In this work, a printable tungsten disulfide (WS2) based ink is developed from readily available WS2 powder (0.6 µm average particle size), and an ink-jet printing based deposition method for a tungsten disulfide film is presented. WS2 flake coverage and bulk electrical characteristics under three different irradiance conditions are examined and discussed. Presence of excitons in the absorbance of the inks is performed by optical UV-Vis spectrometry. Metrics using the A exciton peak generated by the few-layered flakes are used to calculate the average flake lateral dimensions, the concentration of WS2 in the inks after size selection and filtering, as well as the average monolayer count of the flakes. After printing, scanning electron microscopy is used to confirm average flake lateral size and average flake area coverage, while an atomic force microscope is used to confirm flake thickness.

In this work, we have reported the interface characterization of rf sputtered ZnO/HfO2 in thin film transistor structure by dc current-voltage and admittance spectroscopy. The interface state density (Dit) of 1013 eV−1cm−2 was extracted from the Gp/ω vs ω plot was comparable to value obtained from the subthreshold behavior. The grain boundary trap density (NGB) of 9.12×1012 cm−2 was estimated using Levinson’s model. The interface state density distribution below the conduction band edge shows a decreasing trend with energy below the conduction band edge. We also studied the impact of introducing MgO interfacial layer between ZnO and HfO2 interface as an approach towards decreasing the interface state density.

In this report, we studied the role of the oxygen concentration in TiOx layer of Ni/TiOx/TiO2/Ni stack based 2-terminal resistive random access memory (RRAM) devices. The sample with oxygen deficient TiOx layer showed Schottky diode type J-V characteristics in the as-fabricated state while the sample with higher oxygen content in TiOx demonstrated MIM or back-to-back connected diode behavior. The Capacitance-Voltage (C-V) profiling was performed and doping density vs. depletion width characteristic was obtained. The conductance technique was implemented to study the interface state density. The RRAM type switching behavior of these samples was studied. The sample with high oxygen in TiOx showed filament based switching after electroforming while the sample with low oxygen in TiOx showed switching governed by the charge trapping.

Solar cells fabricated from a sputtering target with 5% cadmium sulfide (CdS) intermixed cadmium telluride (CdTe) material was studied using Capacitance-Voltage (CV) profiling. The average efficiency of a set of these novel solar cells under one sun illumination was observed to be 7.56%. In contrast with standard sputtered CdS/CdTe cells, the junction capacitance of the mixed compound device was observed to show minimal change in the entire reverse bias range. The element mapping of the film using Bright Field Scanning Transmission Electron Microscopy (BF-STEM) was used to determine the distribution of S, Te, Cd, O, and Cl in CdTe film. From these observations, it is believed that the morphology and composition of the film resulted in a built-in potential which was sufficient to completely deplete the film.

In this work we have performed Ultraviolet Photoelectron Spectroscopy (UPS) and X-Ray Photoelectron Spectroscopy (XPS) on: (i) 40Å of Ru deposited on 20Å of ALD-HfO2 (Ru-HfO2), (ii) 40Å of Re deposited on 20Å of ALD-HfO2 (Re-HfO2), and (iii) 40Å of W deposited on 20Å of ALD-HfO2 (W-HfO2) in as deposited as well as after 600˚C in-situ anneal exposure. The samples with Ru and Re indicated significant reduction in the oxygen content and shift in the Hf peaks towards higher binding energy after anneal as compared to the as deposited state. The loss of oxygen after anneal was associated with the reduction in the surface work function of Ru and Re measured by UPS. However, the sample with W showed a redistribution of oxygen after anneal leading to the formation of multiple oxides of W having a net higher surface work function. The spectroscopic measurements were correlated with the electrical measurements made on MOS capacitors with Ru metal gates on HfO2 gate dielectric. The results indicated that the oxygen content at metal/high-k interface plays an important role in governing the effective work function of Ru on HfO2 gate dielectric.