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A new geometrical theory of sputtering is extended to investigate the behaviour of interface mixing as a function of the angle of ion incidence. It is found that the amount of mixing peaks with the angle of incidence at different angles depending upon the depth of the interface. When the interface is at the surface the mixing parameter behaves as the sputtering yield and maximises around 70°, whilst deeper interfaces, around the damage range, have maximum mixing at normal incidence.
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