8 results
Linear growth of Ni2Si thin film on n+/p junction at low temperature
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- Journal:
- Journal of Materials Research / Volume 21 / Issue 12 / December 2006
- Published online by Cambridge University Press:
- 03 March 2011, pp. 3017-3021
- Print publication:
- December 2006
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Room temperature grain growth in sputtered Cu films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 749 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, W12.6
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- 2002
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CoSi2 formation using a Ti capping layer - The influence of processing conditions on CoSi2 nucleation.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K7.4
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- 2001
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The influence of Ti and TiN on the thermal stability of CoSi2.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K6.7
- Print publication:
- 2001
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Silicide engineering: influence of alloying elements on CoSi2 nucleation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C8.4.1
- Print publication:
- 2000
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Controlling CoSi2 nucleation : the effect of entropy of mixing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C7.9.1
- Print publication:
- 2000
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Epitaxial CoSi2 formation by a Cr or Mo interlayer
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C10.2.1
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- 2000
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Hydrogen Passivation Caused by ‘Soft’ Sputter Etch Cleaning of Si
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 657
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- 1994
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