3 results
As and B Ion Implantation Through Mo and into Mo-Silicide Layers for Shallow Junction Formation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 157 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 751
- Print publication:
- 1989
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Characteristics of Arsenic Doped Polycrystalline Silicon-Gate Capacitors After Rapid Thermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 106 / 1987
- Published online by Cambridge University Press:
- 22 February 2011, 285
- Print publication:
- 1987
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Radiation Damage Induced Transient Enhanced Diffusion of Dopants in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 74 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 505
- Print publication:
- 1986
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