Atmospheric Pressure Chemical Vapor Deposition (APCVD) and powder spray pyrolysis are both pyrolytic thin film deposition techniques that are used to coat glass with thin films at atmospheric pressure. In the present study, the fluid dynamics of each process was investigated by laser light scattering. For each system, a 193 nm ArF excimer laser pulsed at 7 Hz was used for the analysis. In the case of the APCVD reactor, the difference in Rayleigh scattering between helium injected in the reactor and ambient air was used to characterize the process. For the powder spray process, laser scattering off the sprayed powder was used. The effect of various parameters is discussed.