Pulsed Electron Deposition (PED) is an attractive alternative to Pulsed Laser Deposition (PLD) for growing high temperature superconductor thin films because of its relatively low cost. In this study, YBa2Cu3O7-δ(YBCO) thin film has been fabricated on silicon substrates by Pulsed Electron Deposition technique. SrTiO3 (STO) as a buffer layer has been grown between Si substrate and YBCO superconducting layer. The crystalline structures of STO/Si and YBCO/STO/Si films have been investigated by x-ray diffraction (XRD). The surface morphology and microstructure of YBCO/STO/Si thin film have been characterized with atomic force microscope (AFM) and scanning electron microscope (SEM). From the θ-2θ XRD analysis of YBCO thin films, (00l) diffraction peaks are obtained indicating they have a poor c-axis oriented structure. SEM analysis shows that the surfaces of films are crack-free, but they have some particulates. On AFM images, the droplets are clearly observed leading to a roughly surface.