This paper demonstrates a new technique to form a patterned metal-oxide film on a silicon wafer using a local electric field. The idea of the technique involves using an interaction between metal-organic molecules dissolved in a non-polar solvent and a local electric potential field on a substrate. In this paper, an alkoxide and a metal-organic complex were used as metalorganic precursors. The precursor molecules were selectively deposited at the electrified region of the substrate. The deposited precursor films were heated with an electric furnace to form oxide films. Patterned TiOx and Sr-Ti oxide films were formed on a SiOx/Si substrate. These patterned thin films are potentially applicable to electric and optical devices. We believe that this new technique provides a new bottom-up process of molecular assembly for nanofabrication.

This paper describes a new technique to fabricate two-dimensional microstructures assembled with nano-sized particles. The nano-sized particles attract a lot of attention because of their unique properties compared to bulk materials. Micro- and nano- structures assembled with nano-sized particles have potential applications in electronic, optical and biochemical fields. The Self-Assembled Monolayer (SAM) film patterning is one of the methods to assemble the nano-sized particles. We have proposed a new method to assemble nano-sized particles on a substrate using an electric field generated by an electrified pattern. In this study, following our methods titanium oxide (TiO2, diam.=21nm) particles were patterned on an n-type (100) silicon substrate having an oxidized layer. The particle deposition on the substrates was carried out using a colloidal suspension process and an aerosol process.