We deposited MgF2 thin films using the ion-plating method that features RF and DC biasing to the substrate holder. We investigated the effects of RF powers, substrate temperatures (Ts) and DC bias voltages on optical absorption and abrasion resistance of the films. The optical absorption deteriorated by increasing RF power and Ts. In particular, the deterioration was quite serious when the Ts were above 423 K. The abrasion resistance increased by increasing the Ts. We found that the abrasion resistance could be improved also by increasing a DC bias voltage. The same abrasion resistance as the film deposited by a conventional heat resistance deposition at 573 K was obtained by applying the DC bias voltage of -500 V and the Ts of 300 K.