Self-catalyzed growth of position-defined InP nanowires (NWs) was investigated on SiO2-mask-pattered Si substrates using metalorganic vapor-phase epitaxy. Using low growth temperatures and high group-III flow rates, pyramidal InP NWs were formed vertically on the mask openings. The diameter and tapering of the InP NWs were successfully controlled by the introduction of HCl and H2S gases during the NW growth. In addition, crystal growth of radial InP/InAsP/InP quantum wells on the sidewall of the InP NWs was performed on Si substrates.

Position-controlled InP nanowires (NWs) with separations of 10-100 μm were grown by the vapor-liquid-solid (VLS) method using Au-deposited SiO2-mask-patterned InP substrates. Excess indium species diffused from the large mask region formed plural tilted NW-like structures from single openings in addition to the vertical VLS NWs formed by Au catalyst. The introduction of HCl gas during the NW growth was found to efficiently suppress the tilted NW-like structures. Vertical InP NWs without anomalous growth were successfully formed by controlling the HCl flow rate. Moreover, single InP/InAsP/InP quantum wells (QWs) with wurtzite crystal phase structure were epitaxially grown on the sidewall of the position-controlled InP NWs, and two-dimensional arrayed patterns of photoluminescence (PL) coming from the radial QWs were clearly observed in the 1.3-μm wavelength region at room temperature.