This paper describes the design, modeling, fabrication, and testing of electroplated metal electrostatic torsion micromirror arrays. The goal is to develop novel micromirror arrays optimized for high temperature operation for use in epitaxial growth systems such as MOCVD and MBE to define device structure and hence eliminate the need for etching and lithography. The metallic micromirror arrays were fabricated with a hexagonal shape and with diameters of 0.5 mm2 and 1mm2. The micromirror arrays were structurally composed of primarily electroplated nickel, a mechanically durable material with a high glass transition temperature and with controllable residual stress. The torsion beam was designed with a straight bar and serpentine shape in order to optimize the voltage necessary to tilt the micromirror by ± 10°. A finite element model built in Ansys has been employed to determine the micromirror geometries and performance. A voltage of 130 volts was required to rotate the mirror with a serpentine shape beams by 10°. In addition, the mirror was operated at a resonant frequency of 2.2 kHz.