Nanometer sized gold patterns were produced with controlled spacings using the combination of a top-down (e-beam lithography) and a bottom-up (macromolecular chemistry) technique. Sub-10 nm nanoparticle arrays on silicon consisting of gold nano particles separated by micro meter spacings were fabricated with this approach. Using electron beam lithography, templates comprising of 150 nm to 1 μm sized trenches, holes and aperiodic patterns were made in an electron-beam resist. Block copolymer micelles were then patterned into this template by spincoating. The micelles acted as positioners for a nanometer sized gold precursor that is sequestered within its core. Subsequent removal of the resist layer left an array of Au loaded organic micelles ordered according to the pattern of the template. Exposure of this substrate to a hydrogen plasma removed the organic block copolymer and resulted in an array of sub-10 nm gold nanoparticles/nanoclusters with micron separations. The gold was then used as an anchor point for the tethering of functional molecules in order to localize fluorescent molecules.