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Plasma interactions with L-alanine in aqueous solution have been examined as a basis of fundamental processes in plasma medicine. The plasma interactions with L-alanine in aqueous solution have been examined for investigations of chemical modifications induced by exposures with the atmospheric-pressure hollow-cathode He plasma to the surface of the aqueous solution, which contained L-alanine as a solute in pure water, via chemical bonding states analyses using x-ray photoelectron spectroscopy (XPS). Measurement of hydrogen ion exponent (pH level) of pure water during the atmospheric plasma exposure showed that the pH level decreased to be acidic, but the water temperature did not change. The C 1s XPS spectrum from the L-alanine after the plasma exposure to the aqueous solution showed the decomposition of the -COOH group and the formation of -C=O group.
An ion-assisted chemical vapor deposition method by which Cu is deposited preferentially from the bottom of trenches (anisotropic CVD) has been proposed in order to fill small via holes and trenches. By using Ar + H2 + C2H5OH[Cu(hfac)2] discharges with a ratio H2 / (H2 + Ar) = 83%, Cu is filled preferentially from the bottom of trenches without deposition on the sidewall and top surfaces. The deposition rate on the bottom surface of trenches is experimentally found to increase with decreasing its width.
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