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Reactive-Ion-Etching of 100nm Linewidth Tungsten Features Using SF6:H2 and a Cr-Liftoff Mask
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- Journal:
- MRS Online Proceedings Library Archive / Volume 324 / 1993
- Published online by Cambridge University Press:
- 22 February 2011, 487
- Print publication:
- 1993
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- Article
- Export citation