A new deep level transient spectroscopy (DLTS) technique is described, called half-width at variable intensity analysis. This method utilizes the width and normalized intensity of a DLTS signal to determine the activation energy and capture cross section of the trap that generated the signal via a variable, kO. This constant relates the carrier emission rates giving rise to the differential capacitance signal associated with a given trap at two different temperatures: the temperature at which the maximum differential capacitance is detected, and an arbitrary temperature at which some nonzero differential capacitance signal is detected. The extracted activation energy of the detected trap center is used along with the position of the peak maximum to extract the capture cross section of the trap center.

We report nonlinear optical investigation of green emission GaInN/GaN multi-quantum structures grown along c- and m-axes on sapphire and bulk GaN substrates, respectively. Under intense pulsed photo excitation, we observed strong superluminescence near the lasing condition in c-plane grown quantum well structures with full width at half maximum of 6 nm. The superluminescence couples out of the edge of the sample in a mode pattern consistent with gain in a high mode of the waveguide. The wavelength of the superluminescence is 474 nm. The threshold intensity of superluminescence was found to be 156 kW/cm2. Increasing pump intensity leads to a strong photoluminescence blueshift as large as 380 meV in samples grown along the c-axis on sapphire substrate, while under the same excitation conditions, the blue shift for the m-axis grown structure on bulk GaN substrate is less than 10 meV. The large emission blueshift is hereby attributed to the internal piezoelectric field in the c-axis grown structure. We observe a gain value of 20 cm-1 together with internal absorption losses of 2.3 – 6.0 cm-1 for the superluminescent samples.

In this study, we characterized the structural defects in blue and green GaInN/GaN LEDs grown on c-plane bulk GaN and sapphire substrates. Low density large V-defects with diameters around 600 nm were found in the blue LEDs on bulk GaN. They were initiated by edge-type threading dislocations (TDs) around the homoepitaxial growth interface. On the other hand, a high density 7×109 cm−2 of smaller V-defects with sidewalls on {1101} facets was observed in the active region of green LEDs on sapphire. Their diameter ranges from 150 to 200 nm. Misfit dislocations (MDs) generated in the quantum wells are found to initiate these V-defects. With optimizing the epitaxial growth conditions, the generation of MDs and their smaller V-defects was largely suppressed. As a result, the light output power improved by one order of magnitude. For green LEDs on bulk GaN, another unique type of defect was found in the active region: an inclined dislocation pair (IDP). In it a pair of dislocations propagate at a tilt angle of 18 to 23° from the [0001] growth direction towards <1100>. This defect seems to be a path of strain relief in the high indium composition quantum wells.

With an external laser excitation, the electroluminescence (EL) of GaInN/GaN green light emitting diodes (LEDs) grown on sapphire by metal organic vapor phase epitaxy has been investigated. The EL was found significantly enhanced under this bias and the difference can not merely be attributed to additional photoluminescence (PL). Under 325 nm photon bias, the EL enhancement starts at its highest value and decreases along with an increase of the LED current. Under 408 nm and 488 nm bias, it increases first to a value smaller than that of the 325 nm bias and then decreases with a much lower rate along the current increase. The EL enhancement is attributed to the more efficient carrier injection into quantum wells (QWs) resulting from the screening of the QW polarization by photon bias. Therefore, an enhanced balance of majority and minority carriers was obtained resulting in a better radiative recombination rate. Meanwhile, the current-voltage characteristics show a negative current first and then a voltage reduction as forward voltage increases. The reverse photocurrent indicates carrier loss due to the solar cell effect in our LED device while at high current region the carrier loss is attributed to another effect controlled by the external electrical field. At the balance point of those two effects, the EL enhancement is the highest. These findings clarify the transition from highly efficient radiative recombination at low current density to the region of efficiency droop at high current densities.

GaInN based light emitting diodes (LEDs) play an important role as energy efficient light sources in solid state lighting. A controversial discussion addresses the origin of lateral light emission variations and their correlation with either of the identified defects, e.g., threading dislocations and V-defects. In order to establish any possible correlation of defects and luminescence centers, we analyze three UV, blue and green LED dies by microscopic mapping of spectroscopic cathodoluminescence and secondary electrons at variable low temperature from 7 K to room temperature. Particular effort is being placed on a quantitative analysis of the luminescence signal. Image intensities are not being scaled and offset for highest contrast as otherwise typical for imaging mode. In standard configuration, we analyze image areas of (0.037 mm)2 with pixel resolution of 72 nm. Following regions of strong and weak emission we find that remain bright and dark respectively even at low temperature. Those variations increase with the mean emission wavelength of the LEDs and with temperature. The largest peak wavelength variation associated with the intensity contrast was observed in the green LEDs and amounts to 5 nm. Here the peak wavelength is higher in the dark spots than in the bright ones. This finding corresponds to the general trend when comparing the lower efficiency in longer wavelength green emitters to the blue ones.

The electroluminescence, photoluminescence and cathodoluminescence of GaInN/GaN multiple quantum well light emitting diode dies are analyzed at variable low temperature. Three dies of nominally identical structure but strongly different RT performance from 510 nm to 525 nm have been studied. The electroluminescence peak energy exhibits a blue shift from RT to 158 K followed by a red shift for lower temperature. In the same low-temperature range, a secondary emission peak appears near 390 nm (3.18 eV) that resembles a donor-acceptor pair transition from GaN. Depth profiling spectroscopy of this transition at 77 K reveals its location either in the unintentionally doped quantum barriers or within the n-GaN layer, rather than the commonly believed Mg doped p-type GaN layers. The external quantum efficiency of each die increases as the temperature is lowered. A maximum is reached for all near 158 K while for lower temperature as low as 7.7 K, the efficiency continuously drops. The pronounced efficiency maximum is tentatively assigned to a combination of temperature dependent mobility and shift of the actual pn-junction location.

Optical and structural properties of in situ Cu doped GaN thin films grown on sapphire substrates were optically investigated by means of Raman, photoluminescence (PL), and absorption spectroscopy. Different Cu concentrations in the films were analyzed by secondary ion mass spectroscopy (SIMS) and found to vary from 2×1016 cm-3 to 5×1017 cm-3. Raman studies confirmed high crystalline quality of GaN:Cu with no major structural damages due to Cu incorporation. PL investigation revealed that the origin of the emission around 2.4 eV is most likely due to Cu incorporation. The electrical conductivity of the samples was analyzed by Hall measurements and the found semi-insulating behavior was assigned to the compensation of intrinsic donors by the deep Cu acceptor states.

Group III-nitride compound semiconductors (e.g. AlN-GaN-InN) have generated considerable interest for use in advanced optoelectronic device structures. The fabrication of multi-tandem solar cells, high-speed optoelectronics and solid state lasers operating at higher energy wavelengths will be made possible using (Ga1-y-xAlyInx)N heterostructures due to their robustness against radiation and the wide spectral application range. To date, the growth of indium rich (In1-xGax)N films and heterostructures remains a challenge, primarily due to the large thermal decomposition pressures in indium rich group III-nitride alloys at the optimum growth temperatures. In order to control the partial pressures during the growth process of InN and related alloys, a unique high-pressure chemical vapor deposition (HPCVD) system with integrated real-time optical monitoring capabilities has been developed. We report initial results on InN layers grown at temperatures as high as ∼850°C with reactor pressures around 15 bar. Such process conditions are a major step towards the fabrication of indium rich group III-nitride heterostructures that are embedded in wide band gap group III-nitrides. Real-time optical characterization techniques are applied in order to study the gas phase kinetics and surface chemistry processes during the growth process.

For an ammonia to TMI precursor flow ratio below 500, multiple phases with sharp XRD features are observed. Structural analysis perform by Raman scattering techniques indicates that the E2 high mode improves as NH3:TMI ratio is decreased to below 500. Optical characterization of these InN layers indicates that the absorption edge shifts from down from 1.85 eV to 0.7 eV. This shift seems to be caused by a series of localized absorption centers that appear as the indium to nitrogen stoichiometry varies. This contribution will correlate the process parameters to results obtained by XRD, Raman spectroscopy and optical spectroscopy, in order to assess the InN film properties.

Dual Multi-Quantum Well (MQW) region light emitting diodes (LEDs) for efficient pumping of multiple phosphors have been grown by Metal Organic Chemical Vapor Deposition (MOCVD), for use in broadband, white solid state light sources. Blue (460 nm) and Violet/UV (∼400–420 nm) emitting MQW regions were incorporated into one device and show recombination mechanisms similar to single MQW region devices. The introduction of a decoupling region successfully separated the electroluminescent emissions, and two distinct emission peaks were observed. These devices can be used to pump a variety of phosphors designed for blue and UV sources, allowing for more design flexibility in color rendering and color temperature attributes of solid state light sources.

The incorporation of Mn into GaMnN epilayers by MOCVD growth was investigated. Samples with high Mn concentrations lead to room temperature ferromagnetism. In addition an absorption band around 1.5 eV was observed. Intensity and linewidth of this band scaled with the Mn concentration and with the room temperature (RT) saturation magnetization. This band is assigned to the internal Mn3+ transition between the 5E and the partially filled 5T2 levels of the 5D state. The broadening of the absorption band is introduced by the high Mn concentration. Recharging of the Mn3+ to Mn2+ was found to effectively suppress these transitions resulting also in a significant reduction of the RT magnetization. The pronounced sensitivity of the relative position of the Fermi level and 1.5 eV absorption band can be used to predict the magnetization behavior of the Ga1−xMnxN epilayers. The absence of doping-induced strain was observed by Raman spectroscopy. The structural quality, the presence of Mn2+ ions were confirmed by EPR spectroscopy, meanwhile no Mn-Mn interactions were observed.

This paper reports the Metal Organic Chemical Vapor Deposition (MOCVD) growth of GaN nanostructures. The use of MOCVD allows the direct integration of these nanostructures into pre-existing device technology. The formation of GaN nanostructures grown on AlN epitaxial layers were studied as a function of growth temperature, growth rate, V-III ratio and the amount of deposited material. A wide range of temperatures from 800 °C to 1100 °C and V-III ratios from 30 to 3500 were applied to determine the optimal growth conditions for nucleation studies in a modified production reactor. Small GaN nanostructures with lateral dimensions below 50 nm and low aspect ratios were obtained using relatively low temperatures of 815 °C and extreme metal-rich growth conditions. Island densities up to 1010 cm−2 were achieved using silane as an anti-surfactant to increase the available nucleation sites. Manganese has been incorporated into these nanostructures to enhance the multifunctional ferromagnetic properties of GaMnN.

This work initiates an investigation of molecular co-doping to produce p-type centers in (Ga,Al)N with ionization energies lower than Mg. Dopant complexes can be formed between a doubly ionized acceptor such as (Cu, Li or Ag) and a singly ionized donor (silicon). Ion implantation of Cu, Li and Ag into silicon doped GaN films grown by Metalorganic Chemical Vapor Deposition (MOCVD) has been performed. Secondary ion mass spectroscopy (SIMS) data confirmed the simulated depth profile. High resolution X-ray diffraction and Raman spectroscopy were used to characterize the crystalline damage and subsequent recovery upon anneal. A complete recovery was observed after high temperature (700–900°C) annealing. Low temperature (6K) photoluminescence (PL) for Cu-implanted GaN showed bands identified with crystalline lattice damage due to the Cu-implantation. The annealed samples showed recovery of standard crystalline GaN features. Additional donor-acceptor pair features are observed below 3.35 eV indicating the existence of an acceptor state.