A torsional micromirror was designed and fabricated using a three-level, polysilicon, surface micromachined, microelectromechanical systems (MEMS) process. The torsional micromirrors have highly-reflective, gold-coated polysilicon optical surfaces. Electrostatically induced in-plane and outof-plane vertical deflections on the order of 2.75 νm were achieved. The modeling phase focused on the microdynamical behavior of the torsional micromirror. The IntelliCAD® finite element analysis program was used to generate a plot of the micromirror's deflection (d) versus applied direct current voltage (V). The data was least-squares fitted to the well-established V μ d3/2 relationship. A resonant frequency analysis predicted an approximate switching speed of 6 νsec. The relative reliability (number of operational cycles) of the torsional micromirror design was measured to exceed 2 million flexure events. The potential for using torsional micromirrors as binary optical switches and amplitude modulators is addressed.