We performed a prospective study of 501 patients, regardless of symptoms, admitted to the hospital, to estimate the predictive value of a negative nasopharyngeal swab for severe acute respiratory coronavirus virus 2 (SARS-CoV-2). At a positivity rate of 10.2%, the estimated negative predictive value (NPV) was 97.2% and the NPV rose as prevalence decreased during the study.

Canadian cases and outbreaks of illness caused by Listeria monocytogenes between 1995 and 2004 were assessed. Isolates (722 total) were characterized by serotyping, and pulsed-field gel electrophoresis (PFGE) was performed to provide a means of detecting case clusters. Rates of listeriosis remained fairly consistent during the period of study, and patient characteristics were similar to those seen in studies of other populations. Most isolates were obtained from blood and cerebrospinal fluid, although during some outbreak investigations isolates were also obtained from stools. Serotype 1/2a predominated in isolates from patients in Canada, followed by serotypes 4b and 1/2b. Outbreaks caused by L. monocytogenes that occurred during the period of study were caused by isolates with serotypes 1/2a and 4b. A retrospective analysis of PFGE data uncovered several clusters that might have represented undetected outbreaks, suggesting that comprehensive prospective PFGE analysis coupled with prompt epidemiological investigations might lead to improved outbreak detection and control.

In this paper we find conditions which guarantee that a given flow $\Phi$ on a compact metric space X admits a Lyapunov 1-form $\omega$ lying in a prescribed Čech cohomology class $\xi\in\check H^1(X;\mathbb{R})$. These conditions are formulated in terms of the restriction of $\xi$ to the chain recurrent set of $\Phi$. The result of the paper may be viewed as a generalization of a well-known theorem by Conley about the existence of Lyapunov functions.

Plutonium (Pu) is well known to have complex and unique physico-chemical properties [1]. Notably, the pure metal exhibits six solid-state phase transformations with large volume expansions and contractions along the way to the liquid state: α → β → γ → δ → δ' → ε→ liquid. Unalloyed Pu melts at a relatively low temperature ∼640 °C to yield a higher density liquid than that of the solid from which it melts, (Figure 1). Detailed understanding of the properties of plutonium and plutonium-based alloys is critical for the safe handling, utilization, and long-term storage of these important, but highly toxic materials. However, both technical and and safety issues have made experimental observations extremely difficult.

We report the first case of generalized cytomegalovirus (CMV) disease in an AIDS patient who presented with an acute Sjogren-like syndrome and was diagnosed by parotid gland biopsy. All symptoms disappeared after a few days of intravenous ganciclovir therapy.

Chemical-Mechanical Planarization (CMP) of SiO2 is performed using alkaline silica slurries while CMP of tungsten (W) utilizes acidic slurries with alumina as the abrasive. Proposed mechanisms for the two CMP processes, with more emphasis on SiO2-CMP, have been discussed in literature. However, much less is known about the removal mechanism of residual slurry particles from the planarized surfaces - a crucial step for subsequent device processing. We discuss the chemical and physical basis of post-CMP cleaning by double-side scrubbing using polyvinyl alcohol (PVA) brushes and show how the interactions between the wafer surface, slurry, and the brush material affect the overall cleaning efficiency. Using the zeta potential concept the common features for cleaning surfaces after SiO2-CMP and W-CMP are established and the differences between these two systems are highlighted. We present surface particle levels for two model systems as a function of cleaning chemistries and discuss their influence on post-CMP surface metal levels.

The effects described in this paper are specific to cleaning with mechanical brush scrubbing. Oxides, both thermally grown and deposited are common cleaning applications for mechanical brush scrubbing. Thermally grown oxides present higher final defect counts after scrubbing with deionized water compared to deposited oxides. In this paper we present our results on the cleaning of unpolished and polished oxide surfaces and show differences in these results to be dependent on the chemistry used for cleaning and the degree of hydrophilicity of the wafer surface.