Ultrasonic spray-assisted mist deposition techniques have been developed as a cost-effective and environmental friendly deposition method for oxide and organic thin films. The chemical vapor deposition (CVD) of a variety of oxide thin films having unique functions, such as Cr2O3, Cu2O, Fe3O4, and Al2O3 thin films, has been demonstrated as well as high-quality ZnO and Ga2O3 films ever reported. In addition to the films deposition by the CVD process, the deposition of organic material thin films from the source solution has also been achieved; as examples we have shown the patterned deposition of water-soluble fluorescent polymers with a metal mask. This may substitute the spin-coating technique and contribute to increase the source consumption efficiency in the thin film deposition. We appeal that the mist deposition is a unique and promising technique as a green chemical route for film deposition.