Electrode materials consisting of Cu, Ti and Ni were formed on Bi-doped n-type Mg2Si by means of a monobloc plasma-activated sintering (PAS) technique. Due to the difference in thermal expansion coefficients between Ti and Mg2Si, rather high residual thermal stresses gave rise to the introduction of cracks, which were mainly located in the Mg2Si layer, when Ti was used as the electrode material. In the case of the Cu electrodes, monobloc sintering could not be performed in a reproducible manner because Cu melts abruptly and effuses at around 973K, which is 100 K lower than the sintering temperature that is required for Mg2Si of good crystalline quality. When compared with the results for Cu and Ti, the monobloc PAS process for Ni was both stable and reproducible. The room-temperature I-V characteristics of Ni electrodes were considered to be adequate for practical applications, with durable Mg2Si-electrode junction properties being realized at a practical operating temperature of 600 K with ΔT = 500 K. The highest open circuit voltage (V
) observed was 41 mV at ΔT = 500 K (between 873 K and 373 K) for Ni electrodes fabricated using the monobloc PAS process. The voltage (V) and current (I) values with a 10 Ohm load were ∼ 48 mV and ∼ 2 mA at ΔT = 500 K.