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Photoluminescence (PL) of modulation-doped Al0.22Ga0.78N/GaN heterostructures was investigated. The PL peak related to recombination between the two-dimensional electron gases (2DEG) and photoexcited holes is located at 3.448 eV at 40 K, which is 45 meV below the free excitons (FE) emission in GaN. The peak can be observed at temperatures as high as 80 K. The intensity of the 2DEG PL peak is enhanced significantly by incorporating a thin Al0.12Ga0.88N layer into the GaN layer near the heterointerface to suppress the diffusion of photoexcited holes. The energy separation of the 2DEG peak and the GaN FE emission decreases with increasing temperature. Meanwhile, the 2DEG peak energy increases with increasing excitation intensity. These results are attributed to the screening effect of electrons on the bending of the conduction band at the heterointerface, which becomes stronger when temperature or excitation intensity is increased.
The deformation behavior of single crystals of Mo(Si,Al)2 with the C40 structure has been studied as a function of crystal orientation and Al content in the temperature range from room temperature to 1500°C in compression. Plastic flow is possible only above 1100°C for orientations where slip along <1120> on (0001) is operative and no other slip systems are observed over whole temperature range investigated. The critical resolved shear stress for basal slip decreases rapidly with increasing temperature and the Schmid law is valid. Basal slip appears to occur through a synchroshear mechanism, in which a-dislocations (b=1/3<1120>) dissociate into two synchro-partial dislocations with the identical Burgers vector(b*1/6<1120>) and each synchro-partial further dissociates into two partials on two adjacent planes.
High speed microfabrication of quartz substrates by laser ablation using vacuum ultraviolet (VUV) laser beams is described. The VUV light is generated by anti-Stokes stimulated Raman scattering of fourth harmonics of Q-switched Nd:YAG laser. The well-defined patterns with a cross-sectional profile of rectangular shape are formed by using a contact mask. The role of short wavelength components of the VUV laser beams in the process is discussed.
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