We investigated UV laser irradiation as a method to modify the surface and gas phase chemistry in a diamond growth apparatus. In particular, attempts were made to reproduce reported laser-enhanced deposition. The variables included the laser wavelength and intensity, the precursor gas (and hence the gas-phase absorption), the flow rate, and the gas inlet orientation with respect to the filament. The samples were analyzed using optical microscopy, Scanning Electron Microscopy, the Scanning Auger Microprobe, and micro-Raman scattering. In all cases, the laser radiation suppressed or had no effect on diamond deposition in comparison to the adjacent unirradiated regions. The crystals that did grow in the irradiated regions were similar in size and morphology to those from the unirradiated areas, suggesting ablation or nucleation site blockage as possible deposition suppression mechanisms. The results suggest a novel method for diamond film patterning.