Large-field ion-optics has been developed for reduction printing. Sub-100nm ion projection direct-structuring (IPDS) of patterned magnetic media discs has been demonstrated, extending over 17mm diameter exposure fields, in a single exposure. First results of IPDS patterning of nanocomposite resist material are presented. Information about a novel 200x reduction projection focused ion multi-beam (PROFIB) tool development is provided. Further IPDS nanotechnology applications are discussed.