8 results
A study of ruthenium ultrathin film nucleation on pretreated SiO2 and Hf–silicate dielectric surfaces
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- Journal:
- Journal of Materials Research / Volume 22 / Issue 8 / August 2007
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2254-2264
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- August 2007
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Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric Applications
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- Journal:
- Journal of Materials Research / Volume 20 / Issue 6 / June 2005
- Published online by Cambridge University Press:
- 01 June 2005, pp. 1536-1543
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- June 2005
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Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
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- Journal:
- Journal of Materials Research / Volume 19 / Issue 10 / October 2004
- Published online by Cambridge University Press:
- 01 October 2004, pp. 2947-2955
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- October 2004
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Low-temperature metalorganic chemical vapor deposition of Al2O3 for advanced complementary metal-oxide semiconductor gate dielectric applications
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- Journal:
- Journal of Materials Research / Volume 18 / Issue 8 / August 2003
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1868-1876
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- August 2003
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Chemical Vapor Deposition of Ru and RuO2 for Gate Electrode Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B2.4
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- 2002
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Characterization of Ruthenium and Ruthenium Oxide Thin Films deposited by Chemical Vapor Deposition for CMOS Gate Electrode Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N3.3
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- 2002
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Low Temperature Metal Organic Chemical Vapor Deposition of Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B4.11
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- 2002
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Interface Quality and Electrical Performance of Low-Temperature Metal Organic Chemical Vapor Deposition Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N5.18
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- 2002
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