Plasma generation through vapor breakdown during ablation of a Si target by nanosecond KrF laser pulses is modeled using 0-dimensional rate equations. although there is some previous work on vapor breakdown by microsecond laser pulses, there have been no successful attempts reported on the same subject by nanosecond laser pulses. This work intends to fill the gap. a kinetic model is developed considering the following factors: (1) temperatures of both electrons and heavy-body particles (ions, neutrals, and excited states of neutrals), (2) absorption mechanisms of the laser energy such as inverse bremstrahlung (IB) processes and photoionization of excited states, (3) ionization acceleration mechanisms that include electron-impact excitation of ground state neutrals, electron-impact ionization of excited states of neutrals, photoionization of excited states of neutrals, and all necessary reverse processes. the rates of various processes considered are calculated using a second order predictor-corrector numerical scheme. the rate equations are solved for five quantities, namely, densities of electrons, neutrals, and excited states of neutrals, and the temperatures of electrons and heavy-body particles. the total breakdown times (sum of evaporation time and vapor breakdown time) at different energy fluences are then calculated. the results are compared with experimental observations of Si target ablation using a KrF laser.