Rigorous finite element optical simulations have been used to examine the absorption of light in various crystalline silicon based, nanostructured solar cell architectures. The compared structures can all be produced on glass substrates using a periodically structured dielectric coating and a combination of electron-beam evaporation of silicon and subsequent solid phase crystallization. A required post-treatment by selective etching of non-compact silicon regions results in an absorber material loss. We show that by adequately tailoring the optical design around the processed silicon layer, the absorptance loss due to material removal can be completely overcome. The resulting silicon structure, which is an array of holes with non-vertical sidewalls, shows promising light path enhancement and features an even higher absorptance than the initial nanodome structure of the unetched absorber.