Thin films of organic semiconductor PEDOT:PSS deposited onto silicon and fused
silica substrates. These films were then treated with sulfuric acid
(H2SO4) for various amounts of time (i.e., 10, 20, 40,
60, and 80 minutes). Preliminary results obtained with FT-IR, UV-VIS, and Van
DerPauw conductivity methods suggest that the H2SO4
removes the PSS isonomer from the PEDOT:PSS system. This PSS removal also
induces a decrease in film thickness.