In this work metalorganic chemical vapor phase epitaxy (MOVPE) growth and characterization of AlInN in the whole compositional range and the impact on the development of field effects transistors (FET) structures will be presented. Due to the large difference in the lattice parameters of the binaries AlN and InN the growth of AlInN with high indium concentrations is ambitious, and first the growth conditions for the alloy will be discussed. An experimental phase diagram and corresponding theoretical calculations will be displayed. The critical layer thickness of AlInN on GaN has been experimentally determined. Relaxation of the AlInN-layer has a strong influence on the sample morphology. At indium concentration exceeding 30% an polarization induced hole gas is expected at the AlInN/GaN interface from theoretical calculations, but no p-channel conductivity could be confirmed. The absence of the two dimensional hole gas will be discussed.

Dual Multi-Quantum Well (MQW) region light emitting diodes (LEDs) for efficient pumping of multiple phosphors have been grown by Metal Organic Chemical Vapor Deposition (MOCVD), for use in broadband, white solid state light sources. Blue (460 nm) and Violet/UV (∼400–420 nm) emitting MQW regions were incorporated into one device and show recombination mechanisms similar to single MQW region devices. The introduction of a decoupling region successfully separated the electroluminescent emissions, and two distinct emission peaks were observed. These devices can be used to pump a variety of phosphors designed for blue and UV sources, allowing for more design flexibility in color rendering and color temperature attributes of solid state light sources.

The incorporation of Mn into GaMnN epilayers by MOCVD growth was investigated. Samples with high Mn concentrations lead to room temperature ferromagnetism. In addition an absorption band around 1.5 eV was observed. Intensity and linewidth of this band scaled with the Mn concentration and with the room temperature (RT) saturation magnetization. This band is assigned to the internal Mn3+ transition between the 5E and the partially filled 5T2 levels of the 5D state. The broadening of the absorption band is introduced by the high Mn concentration. Recharging of the Mn3+ to Mn2+ was found to effectively suppress these transitions resulting also in a significant reduction of the RT magnetization. The pronounced sensitivity of the relative position of the Fermi level and 1.5 eV absorption band can be used to predict the magnetization behavior of the Ga1−xMnxN epilayers. The absence of doping-induced strain was observed by Raman spectroscopy. The structural quality, the presence of Mn2+ ions were confirmed by EPR spectroscopy, meanwhile no Mn-Mn interactions were observed.

This work initiates an investigation of molecular co-doping to produce p-type centers in (Ga,Al)N with ionization energies lower than Mg. Dopant complexes can be formed between a doubly ionized acceptor such as (Cu, Li or Ag) and a singly ionized donor (silicon). Ion implantation of Cu, Li and Ag into silicon doped GaN films grown by Metalorganic Chemical Vapor Deposition (MOCVD) has been performed. Secondary ion mass spectroscopy (SIMS) data confirmed the simulated depth profile. High resolution X-ray diffraction and Raman spectroscopy were used to characterize the crystalline damage and subsequent recovery upon anneal. A complete recovery was observed after high temperature (700–900°C) annealing. Low temperature (6K) photoluminescence (PL) for Cu-implanted GaN showed bands identified with crystalline lattice damage due to the Cu-implantation. The annealed samples showed recovery of standard crystalline GaN features. Additional donor-acceptor pair features are observed below 3.35 eV indicating the existence of an acceptor state.