Periodic 2-dimensional (2-D) hexagonal and the disordered pore structure
silica films have been developed using nonionic surfactants as the
templates. The pore structure was controlled by the static electrical
interaction between the micelle of the surfactant and the silica oligomer.
No X-ray diffraction peaks were observed for the disordered mesoporous
silica films, while the pore diameters of 2.0-4.0 nm could be measured by
small angle X-ray scattering spectroscopy. By comparing the properties of
the 2-D hexagonal and the disordered porous silica films which have the same
porosity, it is found that the disordered porous silica film has advantages
in terms of the dielectric constant and Young's modulus as well as the
hardness. The disordered porous silica film is more suitable for the
interlayer dielectrics for ULSI.