Titanium nitride crystals were grown from titanium nitride powder on tungsten by the sublimation-recondensation technique. The bright golden TiN crystals displayed a variety of shapes including cubes, truncated tetrahedrons, truncated octahedrons, and tetrahedrons bounded by (111) and (100) crystal planes. The TiN crystals formed regular, repeated patterns within individual W grains that suggested epitaxy. X-ray diffraction and electron backscattering diffraction revealed that the tungsten foil was highly textured with a preferred foil normal of (100) and confirmed that the TiN particles deposited epitaxially with the orientation TiN(100)‖W(100) and TiN‖W, that is, the unit cells of the TiN crystals were rotated 45° with respect to the tungsten. Because of its larger coefficient of thermal expansion compared to W, upon cooling from the growth temperature, the TiN crystals were under in-plane tensile strain, causing many of the TiN crystals to crack.