Melting and rapid solidification has been induced in DC-sputtered amorphous Ge (a-Ge) films on glass substrates by irradiation with picosecond laser pulses at 583 nm. The melting-solidification kinetics has been followed by means of real time reflectivity measurements with ns resolution and the structure of the rapidly solidified material has been analyzed by means of Raman spectroscopy in micro-Raman configuration. The results obtained show that for laser pulse fluences above a certain threshold recalescence occurs during solidification leading to the formation of nanocrystalline Ge embedded in an amorphous matrix. The phonon correlation length (L) obtained from the Raman spectra of the irradiated regions has been used to analyze the evolution of the crystallite size with the laser fluence. For low fluences above the recalescence threshold, the values of L are in the 8–10 nm range. However, if the fluence is sufficiently increased, the crystallite size shows a clear linear dependence on the fluence with phonon correlation lengths scaling from 6 to 13 nm.