Thin films of tungsten oxide were investigated for use as a top junction in a hybrid photoelectrode. To increase the solar to hydrogen efficiency, the tungsten oxide requires a bandgap reduction to the range of 2.2 to 2.4 eV. Nitrogen doping of WO3 films was employed to reduce the bandgap via valence band modification. For low levels of doping, the bandgap was observed to increase, an effect attributed to decreased size of the polycrystals in the film. The photoelectrochemical efficiency was found to decrease from 80% for pure WO3 to 56% for films deposited at a nitrogen partial pressure of 1.5 mTorr. For even higher doping levels (to 5 mTorr N2), the bandgap was shown to decrease to a value of ∼1.9 eV, but the structural data indicates that significant disorder had been introduced. This disorder is consistent with recurrent dislocations, an effect that is common for the tungsten oxide material.