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As the key part for energy amplification of high-power laser systems, disk amplifiers must work in an extremely clean environment. Different from the traditional cleanliness control scheme of active intake and passive exhaust (AIPE), a new method of active exhaust and passive intake (AEPI) is proposed in this paper. Combined with computational fluid dynamics (CFD) technology, through the optimization design of the sizes, shapes, and locations of different outlets and inlets, the turbulence that is unfavorable to cleanliness control is effectively avoided in the disk amplifier cavity during the process of AEPI. Finally, the cleanliness control of the cavity of the disk amplifier can be realized just by once exhaust. Meanwhile, the micro negative pressure environment in the amplifier cavity produced during the exhaust process reduces the requirement for sealing. This method is simple, time saving, gas saving, efficient, and safe. It is also suitable for the cleanliness control of similar amplifiers.
In this paper, we review the status of the multifunctional experimental platform at the National Laboratory of High Power Laser and Physics (NLHPLP). The platform, including the SG-II laser facility, SG-II 9th beam, SG-II upgrade (SG-II UP) facility, and SG-II 5 PW facility, is operational and available for interested scientists studying inertial confinement fusion (ICF) and a broad range of high-energy-density physics. These facilities can provide important experimental capabilities by combining different pulse widths of nanosecond, picosecond, and femtosecond scales. In addition, the SG-II UP facility, consisting of a single petawatt system and an eight-beam nanosecond system, is introduced including several laser technologies that have been developed to ensure the performance of the facility. Recent developments of the SG-II 5 PW facility are also presented.
The processing method applied to the side surface is different from the method applied to the light pass surface in neodymium phosphate glass (Nd:glass), and thus subsurface defects remain after processing. The subsurface defects in the side surface influence the gain uniformity of Nd:glass, which is a key factor to evaluate the performance of amplifiers. The scattering characteristics of side subsurface defects were simulated by finite difference time domain (FDTD) Solutions software. The scattering powers of the glass fabricated by a computer numerical control (CNC) machine without cladding were tested at different incident angles. The trend of the curve was similar to the simulated result, while the smallest point was different with the complex true morphology. The simulation showed that the equivalent residual reflectivity of the cladding glass can be more than 0.1% when the number of defects in a single gridding is greater than 50.
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