Many semiconductor processes, Organometallic Vapor Phase Epitaxy (OMVPE) in this case, require the use of concentrated hydride sources. The toxicity of many of these compounds (e.g. arsine, diborane) and the pyrophoric nature of others (phosphine and silane) demand that the facility provide both environmental protection and a safe work place. A facility is described which meets stringent environmental emission standards from NY State's Department of Environmental Conservation. The outlined approach also sets new standards for hydride storage and containment, laboratory alarm systems, exhaust gas treatment and dilution, and process integration into the facility. Under normal operation, we demonstrate hydride emissions of less than 10−5 ppb at the exhaust stack.