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Intrinsic, n- and p-type a-Si:H films were deposited by dc magnetron sputtering and analyzed with several techniques. The films were synthesized in a reactive Ar-H2 atmosphere giving H contents in the range of 3-20 at %. The films were sputtered from pure silicon targets and doped silicon targets with 1 at % B or P. Doping by co-sputtering from composite Si/B4C targets was also explored. The doping concentrations were 3 × 1020 − 2 × 1021 cm-3 for the p-type films and 2.6-2.9 × 1019 cm-3 for the n-type films. The conductivity was in the range 10-2−10-4 Ω-1 cm-1 for p-doped films and 10-5 Ω-1 cm-1 for the best n-doped films. Band gap estimations were obtained from dielectric function data and showed an increase with hydrogen content. A comparison to device quality PECVD-samples was also made.
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