The interfacial fracture properties of a representative polymer/metal interface commonly found in microelectronic applications are examined. The double cantilever beam (DCB) configuration was used to investigate the effects of environmental variables on interfacial adhesion and progressive delamination under monotonic and cyclic fatigue loading conditions. The steady-state interfacial fracture energy, Gss, taken from the plateau of the R-curve, of a representative silica-filled Phenol-Novolac epoxy on a Nielectroplated Cu substrate showed little sensitivity to the presence of moisture. On the other hand, both the initiation interfacial fracture energy, Gi, and the entire progressive debond curve under fatigue loading were remarkably sensitive to moisture and temperature, respectively. Debonding is modeled in terms of interface structure, chemistry using chemical reaction rate theory, and relaxation process at the debond tip. The activation energy for stage I debond growth is found to be 140 kJ/mol and 63 kJ/mol for stage II for the current polymer/metal interface.