A new approach for the use of porous alumina films as a template for nanofabrication is presented. In this process the porous films are prepared on silicon substrates, simplifying both the template fabrication and subsequent processing, and improving the quality of the films and their surfaces. Structural analysis of the film was carried out. Bismuth and bismuth telluride nanowires were prepared by pressure injection and electrochemical deposition, respectively, in alumina films 5-10 μ thick with parallel ordered pores 40 nm in diameter. The films were also patterned by lithography, offering new opportunities for area-selective anodization of non-planar structures. The new approach offers a straightforward method for the fabrication of arrays of nanostructures and their incorporation into electronic and optical devices.