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Bottom-up assembly of nanomaterials using solution-processed methods is ideally suited for use in fabrication of large-area optoelectronic devices. Tailorable visible and near-infrared absorption in shaped nanostructured noble metals is strongly influenced by localized plasmon resonance effects. Obtaining sharp and selective absorption with solution-processed methods is a challenge and requires suitable control on the growth kinetics, which ultimately results in appropriate size and morphology of the final product. In this work, a photo-assisted multigenerational growth process for synthesis of silver nanotriangle ink with narrow linewidth absorbance is developed. This technique combines photochemical and seed-mediated growth approaches. The resulting ink exhibits a sharp absorption at 700 nm with full width at half maximum of ∼170 nm, verified by absorption as well as dynamic light scattering, transmission electron microscopy, and field emission scanning electron microscopy measurements. Numerical modeling using finite-difference time-domain calculations yields a close match with observed absorption and is used to examine electric field distribution and enhancement factor resonating at 720 nm. The synthesis technique is potentially useable for production of highly selective absorbers in solution phase.
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