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Physical and Electrical Characterization of Hafnium Silicate Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N8.3/T6.3
- Print publication:
- 2002
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- Article
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Physical and Electrical Characterization of Hafnium Silicate Thin Films
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 747 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, T6.3/N8.3
- Print publication:
- 2002
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- Article
- Export citation
Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K2.1
- Print publication:
- 2001
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Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 568 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 283
- Print publication:
- 1999
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