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Interface Study of SiO2/ HfO2/SiO2 Stacks Used as InterPoly Dielectric for Future Generations of Embedded Flash Memories
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1252 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1252-I07-08
- Print publication:
- 2010
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- Article
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