Hostname: page-component-8448b6f56d-qsmjn Total loading time: 0 Render date: 2024-04-16T17:34:02.069Z Has data issue: false hasContentIssue false

The surface properties of treated ITO substrates effect on the performance of OLEDs

Published online by Cambridge University Press:  24 June 2006

Z. Y. Zhong*
Affiliation:
School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, P.R. China
Y. D. Jiang
Affiliation:
School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, P.R. China
Get access

Abstract

Surface modification was performed on the indium-tin-oxide (ITO) substrates for organic light-emitting diodes (OLEDs) by oxygen plasma. The effects of oxygen plasma treatment on the surface properties of ITO substrates and its aging were investigated by the measurements of the chemical composition, contact angle and surface energy. We observe that oxygen plasma treatment improves the stoichiometry of the surface and enhances ITO wetting, so as to improve the surface properties of ITO substrates. With the increment of storage time, however, the improved ITO surface properties tend to decay and the surface energy decreases. Furthermore, we studied the effect of aging variation of surface properties of treated ITO substrates on the performance of OLEDs, in terms of driving voltage, luminance, and efficiency. The device performance of the OLEDs was found to become worse with the increasing storage time after oxygen plasma on ITO substrates. The results demonstrate that the device performance of the OLEDs strongly depends on the surface properties of the ITO substrates.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Tang, C.W., Van Slyke, S.A., Appl. Phys. Lett. 51, 913 (1987) CrossRef
Burroughes, J.H., Bradley, D.D.C., Brown, A.R. et al., Nature 347, 539 (1990) CrossRef
Liao, L.S., Klubek, K.P., Tang, C.W., Appl. Phys. Lett. 84, 167 (2004) CrossRef
Chwang, A.B., Kwong, R.C., Brown, J.J., Appl. Phys. Lett. 80, 725 (2002) CrossRef
Wu, C.C., Wu, C.I., Sturm, J.C. et al., Appl. Phys. Lett. 70, 1348 (1997) CrossRef
Kim, J.S., Granström, M., Friend, R.H. et al., J. Appl. Phys. 84, 6859 (1998) CrossRef
Choi, B., Yoon, H., Lee, H.H., Appl. Phys. Lett. 76, 412 (2000) CrossRef
Van Slyke, S.A., Chen, C.H., Tang, C.W., Appl. Phys. Lett. 69, 2160 (1996) CrossRef
So, S.K., Choi, W.K., Cheng, C.H. et al., Appl. Phys. A 68, 447 (1999) CrossRef
Nüesch, F., Rothberg, L.J., Forsythe, E.W. et al., Appl. Phys. Lett. 74, 880 (1999) CrossRef
Ishida, T., Kobayashi, H., Nakato, Y., J. Appl. Phys. 73, 4344 (1993) CrossRef
Zhu, F., Huan, C.H.A., Zhang, K. et al., Thin Solid Films 359, 244 (2000) CrossRef
Jung, S., Park, N.G., Kwak, M.Y. et al., Opt. Mater. 21, 235 (2003) CrossRef
Appleyard, S.F.J., Willis, M.R., Opt. Mater. 9, 120 (1998) CrossRef
Hatton, R.A., Day, S.R., Chesters, M.A. et al., Thin Solid Films 394, 291 (2001) CrossRef
D. Briggs, M.P. Seah, Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy (John Wiley & Sons Ltd., New York, 1983)
S. Wu, Polymer Interface and Adhesion (Marcel Dekker, New York, 1982)
van Oss, C.J., Good, R.J., Chaudhury, M.K., J. Colloid Interf. Sci. 111, 378 (1986) CrossRef
Ishii, M., Mori, T., Fujikawa, H. et al., J. Lumin. 87–89, 1165 (2000) CrossRef
M.G. Mason, L.S. Hung, C.W. Tang et al., J. Appl. Phys. 86, 2116 (1999)
Kwon, S.H., Paik, S.Y., Yoo, J.S., Synth. Met. 130, 55 (2002) CrossRef
Carter, J.C., Grizzi, I., Heeks, S.K. et al., Appl. Phys. Lett. 71, 34 (1997) CrossRef
Scott, J.C., Carter, S.A., Karg, S. et al., Synth. Met. 85, 1197 (1997) CrossRef
Carter, S.A., Angelopoulos, M., Karg, S. et al., Appl. Phys. Lett. 70, 2067 (1997) CrossRef
Kim, J.-S., Cacialli, F., Friend, R., Thin Solid Films 445, 358 (2003) CrossRef
Kim, J.S., Friend, R.H., Cacialli, F., Appl. Phys. Lett. 74, 3084 (1999) CrossRef