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Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

  • H. Nishiyama (a1) and M. Shigeta (a1)

Abstract

The functions of the plasma flow such as electrical conductivity, thermal conduction and chemical reaction can be enhanced by seeding vaporized alkali metal with low ionization potential. In the present study, numerical simulation is conducted for the radio frequency inductively coupled plasma of which functions are enhanced by seeding a small amount of vaporized alkali metal. The effects of seeding, injection flow rate and applied coil frequency on the plasma characteristics are clarified by relating to the flow structure and electromagnetic effect.

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