Hostname: page-component-76fb5796d-skm99 Total loading time: 0 Render date: 2024-04-25T13:22:57.678Z Has data issue: false hasContentIssue false
  • English
  • Français

Influence of copper thin film as an electrode on the DC electrical breakdown in the presence of Ar and air

Published online by Cambridge University Press:  03 August 2012

K. Yasserian ,
R. Zaresirous  and
A. Hojabri
K. Yasserian*
Affiliation:
Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
R. Zaresirous
Affiliation:
Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
A. Hojabri
Affiliation:
Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran
*
ae-mail: kiomars.yaserian@kiau.ac.ir
Get access

Abstract

Electrical breakdown for low pressure argon gas and air, using copper thin films as the electrodes, was investigated. A specially designed cathode was built from copper thin film deposited on glass by a magnetron sputtering system creating the breakdown between those electrodes. The left side of Paschen’s curve and ionization coefficient η as well as the effective electron emission coefficient γ was obtained with respect to the variation of reduced electric fields for argon gas and air for different thin films thicknesses. It is concluded that reducing the thin film thickness as an electrode leads to a decrease of breakdown voltage and amplifying secondary electron emission. In addition, the influence of the gas type on dependence of breakdown characteristics on the electrode thickness was investigated.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 59 , Issue 1 , July 2012 , 10801
Copyright
© EDP Sciences, 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Bogaerts, A., Neyts, E., Gijbels, R., Van Der Mullen, J., Spectrochim. Acta Part B 57, 609 (2002)CrossRef
Dufour, T., Overzet, L.J., Dussart, R., Pitchford, L.C., Sadeghi, N., Lefaucheux, P., Kulsreshath, M., Ranson, P., Eur. Phys. J. D 60, 565 (2010)CrossRef
Bingang, G., Chunliang, L., Zhongxiao, S., Yufeng, F., Xing, X., Liu, L., Duowang, F., Eur. Phys. J. Appl. Phys. 31, 185 (2005)
Cai, X., Zou, X., Wang, X., Wang, L., Guan, Z., Jiang, W., Laser Part. Beams 28, 443 (2010)CrossRef
Ghaleb, F., Benstaali, W., Belasri, A., Mater. Sci. Eng. C 28, 791 (2008)CrossRef
Sismanoglu, B.N., Amorim, J., Eur. Phys. J. Appl. Phys. 41, 165 (2008)CrossRef
Stamenković, S.N., Markovic, V.Lj., Gocić, S.R., Eur. Phys. J. Appl. Phys. 45, 11003 (2009)CrossRef
Markovic, V.Lj, Gocić, S.R., Radović, M.K., Eur. Phys. J. Appl. Phys. 6, 303 (1999)CrossRef
Pejovic, M.M., Ristic, G.S., Karamarkovic, J.P., J. Phys. D: Appl. Phys. 35, R91 (2002)CrossRef
Raether, H., Electron Avalanches and Breakdown in Gases (Butterworths, London, 1964)Google Scholar
Lozansky, E.D., Firsov, O.B., Theory of Sparks (Atomizdat, Moscow, 1975)Google Scholar
von Engel, A., Handbuch der Physik (Springer, Berlin, 1956)Google Scholar
Ward, A.L., J. Appl. Phys. 33, 2789 (1962)CrossRef
von Engel, A., Ionized Gases (Clarendon, Oxford, 1965)Google Scholar
Auday, G., Guillot, P., Galy, J., Brunet, H., J. Phys. D: Appl. Phys. 83, 5917 (1998)
Meek, J.M., Graggs, J.D., Electrical Breakdown of Gases (Clarendon, Oxford, 1953)Google Scholar
Brown, S.C., Basic Data of Plasma Physics (MIT Press, Cambridge, MA, 1959)Google Scholar
Baragiola, R.A., Alonso, E.V., Florio, O.A., Phys. Rev. B 19, 121 (1979)CrossRef
Koyama, A., Shikata, T., Sakairi, H., Jpn J. Appl, Phys. 20, 65 (1981)CrossRef
Lakits, G., Arnau, A., Winter, H., Phys. Rev. B 42, 15 (1990)CrossRef
Phelps, A.V., Petrovic, Z.L., Plasma Source Sci. Technol. 8, R21 (1999)CrossRef
Bogaerts, A., Gijbels, R., Plasma Source Sci. Technol. 11, 27 (2002)CrossRef
Depla, D., Tomaszewski, H., Buyle, G., De Gryse, R., Surf. Coat. Technol. 201, 848 (2006)CrossRef
Batt, R.J., Mee, C.H.B., J. Vac. Sci. Technol. 6, 737 (1969)CrossRef
Hoffmann, H., Hornauer, H., Jacob, U., Vancea, J., Thin Solid Films 131, 1 (1985)CrossRef
Vanecea, J., Reiss, G., Butz, D., Hoffmann, H., Europhys. Lett. 9, 379 (1989)CrossRef
Nunes, Y., Wemans, A., Gordo, P.R., Ribeau Teixeira, M., Maneira, M.J.P., Vacuum 81, 1511 (2007)CrossRef
Petraconi, G., Maciel, H.S., Pessoa, R.S., Murakami, G., Massi, M., Otani, C., Uruchi, W.M.I., Sismanoglu, B.N., Braz. J. Phys. 34, 4B (2004)CrossRef