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Dissociation of N2 in flowing glow discharge: Influence of H2 *

  • A. R. de Souza (a1), M. Digiacomo (a1), J. L. R. Muzart (a1), J. Nahorny (a2) and A. Ricard (a1) (a2)...

Abstract

The N2 dissociation yield has been measured in a flowing post-discharge containing H2 between 0 to 5%. The N atom density has been determined in the fast post-discharge (Δt = 5 × 10−2 s) electric field has been measured by electrostatic probes as a function of H2 relative concentration. It is demonstrated that the H2 produces a significant increase in the N-atom concentration measured in the post-discharge. For our experimental conditions it was determined an increase up to 3 times in comparison to pure nitrogen discharge. The maximum yield of N-atoms was obtained for a H2 relative concentration of about 2%. This result cannot only be explained by the decrease of N atoms surface losses. It is demonstrated that the N2 dissociation increase is also the result of an increase of the discharge reduced electric field.

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[1] Cacciatore, M., Capitelli, M., Gorse, C., Chem. Phys. 66, 141 (1982).
[2] Loureiro, J., Ferreira, C.M., Capitelli, M., Gorse, C., Cacciatori, M., J. Phys. D: Appl. Phys. 23, 1371 (1990).
[3] Ricard, A., Rev. Phys. Appl. 24, 251 (1989).
[4] Ricard, A., Malvos, H., H. Michel. J. Phys. D: Appl. Phys. 27, 1328 (1994).
[5] Kaufman, F., Kelso, J.R., J. Chem. Phys. 32, 301 (1960).
[6] Brown, R.L., J. Phys. Chem. 71, 2492 (1967).
[7] Sobrinho, A.S.S., de Souza, A.R., Drago, V., Muzart, J.L.R, Rev. Bras. Inst. Fis. Apl. 3, 84 (1993).
[8] de Souza, A.R., Mahlmann, C.M., Muzart, J.L.R., Speller, C.V., J. Phys D: Appl. Phys. 26, 2164 (1993).
[9] Gordiets, B., Ferreira, C.M., Guerra, V., Loureiro, J., Nahorny, J., Pagnon, D., M. touzeau M. Vialle, IEEE Trans. Plasma. Sci. 23, 750 (1995).
[10] Loureiro, J., Ricard, A., J. Phys. D: Appl. Phys. 26, 163 (1993).
[11] M. Moisan, J. Pelletier, Microwave Excited Plasma (Elsevier Science, Amesterdam, 1992), Vol. 4.
[12] Piper, L.G. , Caledonia, G.E., Kennealy, J.P., J. Chem. Phys. 75, 2847 (1981).
[13] Piper, L.G., J. Chem. Phys. 91, 864 (1989).
[14] Ricard, A., A.R. de Souza. J. Phys. III France 4, 2593 (1994).
[15] Bockel, S., Diamy, A.M., A. Ricard. Surf. Coat. Tech. 74, 474 (1995).
[16] Amorim, J., Baravian, G., Ricard, A., Plasma Chem. Plasma Process 15, 721 (1995).
[17] S. Bockel, G. Baravian, A. Ricard, Le Vide (CIP, Antibes France, 1995).
[18] Nahorny, J., Ferreira, C.M., Gordiets, B, Pagnon, D., Touzeau, M., Vialle, M., J. Phys. D.: Appl. Phys. 28, 738 (1995).
[19] Gordiets, B., Ferreira, C. M., Pinheiro, M.J., Ricard, A., Plasma Sources Sci. Tech. 7, 363 (1998).

Keywords

Dissociation of N2 in flowing glow discharge: Influence of H2 *

  • A. R. de Souza (a1), M. Digiacomo (a1), J. L. R. Muzart (a1), J. Nahorny (a2) and A. Ricard (a1) (a2)...

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