Hostname: page-component-848d4c4894-2xdlg Total loading time: 0 Render date: 2024-06-19T00:34:24.183Z Has data issue: false hasContentIssue false
  • English
  • Français

D-101 From Lab to Fab: The Development and Deployment of New Metrology Technology for the Global Semiconductor Industry—Invited

Published online by Cambridge University Press:  20 May 2016

B. Landes ,
B. Kern ,
J. Niu ,
C. Mohler ,
J. Hahnfeld ,
D. Yontz ,
K. Ender ,
C. Silvis ,
R. Strittmatter  and
L. Moore
...Show all authors
B. Landes
Affiliation:
Dow Chemical Co., Midland, MI
B. Kern
Affiliation:
Dow Chemical Co., Midland, MI
J. Niu
Affiliation:
Dow Chemical Co., Midland, MI
C. Mohler
Affiliation:
Dow Chemical Co., Midland, MI
J. Hahnfeld
Affiliation:
Dow Chemical Co., Midland, MI
D. Yontz
Affiliation:
Dow Chemical Co., Midland, MI
K. Ender
Affiliation:
Dow Chemical Co., Midland, MI
C. Silvis
Affiliation:
Dow Chemical Co., Midland, MI
R. Strittmatter
Affiliation:
Dow Chemical Co., Midland, MI
L. Moore
Affiliation:
Dow Chemical Co., Midland, MI
T. Stokich
Affiliation:
Dow Chemical Co., Midland, MI
D. King
Affiliation:
Dow Chemical Co., Midland, MI
J. Quintana
Affiliation:
Northwestern University, Chicago, IL
S. Weigand
Affiliation:
Northwestern University, Chicago, IL
Get access Rights & Permissions [Opens in a new window]

Abstract

An abstract is not available for this content so a preview has been provided. Please use the Get access link above for information on how to access this content.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Denver X-Ray Conference
Information
Powder Diffraction , Volume 19 , Issue 2 , June 2004 , pp. 195
Copyright
Copyright © Cambridge University Press 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)