Hostname: page-component-cd9895bd7-lnqnp Total loading time: 0 Render date: 2024-12-13T18:43:31.177Z Has data issue: false hasContentIssue false

X-ray microdiffraction study of the half-V-shaped switching liquid crystal

Published online by Cambridge University Press:  06 March 2012

Kazuhiro Takada*
Affiliation:
Leading-Edge Technology Development Headquarters, Canon Inc., Morinosato-Wakamiya, Atsugi, Kanagawa 243-0193, Japan
Takashi Noma
Affiliation:
Leading-Edge Technology Development Headquarters, Canon Inc., Morinosato-Wakamiya, Atsugi, Kanagawa 243-0193, Japan
Takeshi Togano
Affiliation:
Leading-Edge Technology Development Headquarters, Canon Inc., Morinosato-Wakamiya, Atsugi, Kanagawa 243-0193, Japan
Taihei Mukaide
Affiliation:
Leading-Edge Technology Development Headquarters, Canon Inc., Morinosato-Wakamiya, Atsugi, Kanagawa 243-0193, Japan
Atsuo Iida
Affiliation:
Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization, Oho, Tsukuba, Ibaraki 305-0801, Japan
*
a)Electronic mail: takada.kazuhiro@canon.co.jp

Abstract

Local layer structures and their formation process in a half-V-shaped switching ferroelectric liquid crystal (HV-FLC) were investigated by means of synchrotron X-ray microdiffraction. The HV-FLC is a FLC that has a cholesteric–chiral smectic C (Ch–SmC*) phase transition sequences. X-ray microdiffraction measurements revealed that the SmC* phase in the HV-FLC was composed of asymmetric chevron and inclined-bookshelf structures. In addition, temperature-controlled X-ray diffraction measurements showed that the transient layer structures appeared during the Ch to SmC* phase transition.

Type
Technical Articles
Copyright
Copyright © Cambridge University Press 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Asao, Y., Togano, T., Terada, M., Moriyama, T., Nakamura, S., and Iba, J. (1999). Jpn. J. Appl. Phys. JJAPA5 38, 5977. jja, JJAPA5 CrossRefGoogle Scholar
Clark, N. A.and Lagerwall, S. T. (1980). Appl. Phys. Lett. APPLAB 36, 899. apl, APPLAB CrossRefGoogle Scholar
Hasegawa, R. and Takatou, T. (2002). The Japanese Liquid Crystal Society Annual Meetings.Google Scholar
Iida, A.and Noma, T. (1993). Nucl. Instrum. Methods Phys. Res. B NIMBEU 82, 129. nib, NIMBEU CrossRefGoogle Scholar
Takada, K., Noma, T., Togano, T., Mukaide, T., and Iida, A. (2003). Jpn. J. Appl. Phys. JJAPA5 42, 4431. jja, JJAPA5 CrossRefGoogle Scholar