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Xps and Aes Studies of the Initial Stage of CdTe Growth on (100) GaAs by Movpe

Published online by Cambridge University Press:  28 February 2011

Mitsuru Ekawa
Affiliation:
Dept. of Electrical and Computer Engineering, Nagoya Institute of Technology, Showa, Nagoya 466, JAPAN
Kazuhito Yasuda
Affiliation:
Dept. of Electrical and Computer Engineering, Nagoya Institute of Technology, Showa, Nagoya 466, JAPAN
Syuji Sone
Affiliation:
Dept. of Electrical and Computer Engineering, Nagoya Institute of Technology, Showa, Nagoya 466, JAPAN
Yoshiyuki Sugiura
Affiliation:
Dept. of Electrical and Computer Engineering, Nagoya Institute of Technology, Showa, Nagoya 466, JAPAN
Manabu Saji
Affiliation:
Dept. of Electrical and Computer Engineering, Nagoya Institute of Technology, Showa, Nagoya 466, JAPAN
Akikazu Tanaka
Affiliation:
Electronics Materials Laboratory, Sumitomo Metal Mining Co., Ltd., Ohme, Tokyo 198, JAPAN
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Abstract

XPS and AES analyses were performed to investigate the initial growth mechanism and the selection of the growth orientations of CdTe layers grown on (100) GaAs substrates by MOVPE. The (100) CdTe growth was reproducibly achieved when the GaAs surface was completely covered by one monolayer of Te before the growth, otherwise (111) growth occurred.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

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