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Waste Minimization In Semiconductor Processing

  • Steven J. Hardwick (a1) and Joanne C. Mailloux (a1)

Abstract

The US semiconductor industry uses 5–7 thousand pounds of arsine annually. Fifty to eighty percent of the arsine used becomes a waste product, which requires abatement. Traditional methods of abatement are reviewed with an emphasis on dry chemical scrubbing. A variety of dry chemical scrubbing materials were evaluated for arsine capacity, using activated carbon as the baseline for comparison. A proprietary mixed oxide composition, employing copper oxide as the active ingredient was identified as having high capacity and efficiency. Disposal and possible reclamation options are discussed.

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1 Herman, T. and Soden, S., in AlP Conference Proceedings 166 - Photovoltaic Safety edited by Werner, Luft, (American Institute of Physics, New York, 1988) pp. 99108.
2 Cotton, M.L., Johnson, D. and Wheeland, K. G., Can. Metall. Q., 16, 205 (1977).
3 Haake, G., Brinen, J.S. and Burkhard, H., J. Electrochem. Soc., 135, 715 (1988).
4 Gallons is typically a fluid measurement. Dry scrubber media like activated carbon, are sold commercially on a volume, rather than a weight basis. In addition, disposal costs are related to volume; i.e., number of 55 gallon drums. The bulk density of activated carbon is 0.56 g/cc.
5 “Type FCA Granular Carbon”, Product Bulletin 23–100d, Calgon Carbon Corporation, Pittsburg, PA, USA.
6 Volume of waste was condsidered the key issue for reasons described in reference 4.
7 “Corusob 200”, Information Sheet, Carus Chemical Company, Ottawa, IL, USA.
8 Goekcek, C., U.S. Patent No. 5,024,823 (June 18, 1991).

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