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Wafer-Scale Laser Pantography: IV. Physics of Direct Laser-Writing Micron-Dimension Transistors

Published online by Cambridge University Press:  21 February 2011

Irving P. Herman ,
Bruce M. Mcwilliams ,
Fred Mitlitsky ,
Hon Wah Chin ,
Roderick A. Hyde  and
Lowell L. Wood
Irving P. Herman
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, CA 94550, USA
Bruce M. Mcwilliams
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, CA 94550, USA
Fred Mitlitsky
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, CA 94550, USA
Hon Wah Chin
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, CA 94550, USA
Roderick A. Hyde
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, CA 94550, USA
Lowell L. Wood
Affiliation:
Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, CA 94550, USA
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Abstract

The processes involved in the fabrication of micron-dimension transistors and small-scale integrated circuits using only the technique of direct laser-writing by localized pyrolytic surface reactions are discussed. New experimental findings in the deposition of tungsten by silicon. surface reduction of tungsten hexafluoride and doped polysilicon are presented. The techniques used to fabricate laser beam-written n-MOSFET's are being extended to make unipolar JFET's and bipolar lateral pnp transistors.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 29
Copyright
Copyright © Materials Research Society 1984

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References

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