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Visible-Wavelength Laser Photodeposition of Cobalt Interconnects

  • M. Rothschild (a1), J. H. C. Sedlacek (a1), D. C. Shaver (a1), D. J. Ehrlich (a1), S. N. Bittenson (a2), D. Edwards (a2) and N. P. Economou (a2)...

Abstract

Cobalt interconnects were deposited with a cw visiblewavelength laser from gaseous Co2 (CO)8. The deposited material was high-purity Co, and its electrical resistivity was as low as 13 μΩ-cm (twice that of bulk resistivity). The deposition is initiated by photochemical decomposition of Co2 (CO)8, and therefore process parameters (pressure, power, writing speed) are insensitive to the optical and thermal properties of the substrate.

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1. Jackson, R. L., Baum, T. H., Kodas, T. T., Ehrlich, D. J., and Comita, P. B., in Laser Microfabrication, edited by Ehrlich, D. J. and Tsao, J. Y. (Academic, Boston, 1989).
2. Herman, J. P., Chem. Rev. 89, 1323 (1989).
3. Arnone, C., Rothschild, M., Black, J. G., and Ehrlich, D. J., Appl. Phys. Lett. 48, 1018 (1986).
4. CRC Handbook of Chemistry and Physics, edited by Weast, R. C., Astle, M. J., and Beyer, W. H. (CRC Press, Boca Raton, Florida, 1984).

Visible-Wavelength Laser Photodeposition of Cobalt Interconnects

  • M. Rothschild (a1), J. H. C. Sedlacek (a1), D. C. Shaver (a1), D. J. Ehrlich (a1), S. N. Bittenson (a2), D. Edwards (a2) and N. P. Economou (a2)...

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