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Visible-Light Inactivation of Escherichia Coli on N-Doped Titanium Oxide Thin Films

Published online by Cambridge University Press:  01 February 2011

Pinggui Wu
Affiliation:
pwu1@uiuc.edu, University of Illinois at Urbana-Champaign, Department of Materials Science and Engineering, 1304 W. Green St., Urbana, IL, 61801, United States, 217-333 2736
JianKu Shang
Affiliation:
jkshang@uiuc.edu, University of Illinois at Urbana-Champaig, Department of Materials Science and Engineering, 1304 W. Green St., Urbana, IL, 61801, United States
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Abstract

Antimicrobial behavior of nitrogen-doped titanium dioxide (TiON) thin films was examined by cell viability assays under visible light illumination, using Escherichia coli as the indicator. The nitrogen doping was found to enable visible-light inactivation of Escherichia coli on titanium oxide films. At a light intensity of 1.6 mW/cm2, TiON films reached a bacterial killing rate of about 50% in half an hour, comparable to those reported for ultraviolet light irradiated TiO2. In the range of nitrogen concentrations from 0.2 to 0.9, the bacterial killing rates showed no clear correlation with the nitrogen concentration for the TiON films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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