Hostname: page-component-8448b6f56d-42gr6 Total loading time: 0 Render date: 2024-04-23T12:09:25.598Z Has data issue: false hasContentIssue false

A Vibrational Analysis of Au Implanted Al2O3 Single Crystals: Ion and Thermal Annealing Effects

Published online by Cambridge University Press:  25 February 2011

D. O. Henderson
Affiliation:
Fisk University, Physics Dept., Nashville, TN 37208
S. H. Morgan
Affiliation:
Fisk University, Physics Dept., Nashville, TN 37208
R. Mu
Affiliation:
Fisk University, Physics Dept., Nashville, TN 37208
N. Chen
Affiliation:
Fisk University, Physics Dept., Nashville, TN 37208
R. H. Magruder III
Affiliation:
Vanderbilt University, Physics Department, Nashville, TN 37235
C. W. White
Affiliation:
Fisk University, Physics Dept., Nashville, TN 37208
R. A. Zuhr
Affiliation:
Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 3.7831–6057
Get access

Abstract

The implantation of Au into Al2O3 leads to disruption of the crystal order producing an amorphous layer. Annealing the implanted crystals at 1373 K restores the crystallinity and also imparts a purple color to the implanted layer which is attributed to a surface plasmon resulting from the formation of Au colloids.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. White, C. W., McHargue, C. J., Sklad, P. S., Boatner, L. A., and Farlow, G. C., Mater. Sci. Rep. 4, 43 (1989).Google Scholar
2. Haglund, R. F., Magruder, R. H., Morgan, S. H., Henderson, D. O., Weiler, R. A., Yang, L., and Zuhr, R. A., Nucl. Inst. Met. B65, 405 (1992).Google Scholar
3. White, C. W., Thomas, D. K., Zuhr, R. A., McCallum, J. C., Pogany, A., Haglund, R. F., Magruder, R. H., and Yang, L. in Materials Modification by Energetic Atoms and Ions, edited by Grabowski, K. S., Barnett, S. A., Rossnagel, S. M., and Wasa, K. (Mater. Res. Proc. 268, San Francisco, CA 1992) 331336.Google Scholar
4. Arnold, G. W., Krefft, G. W., and Norris, C. B., Appl Phys. Lett. 25, 540 (1974).CrossRefGoogle Scholar
5. Crawford, J. H., J. Nucl. Mat. 108/109, 644 (1982).Google Scholar
6. Barker, A. S., Phys. Rev 132, 1474 (1963).CrossRefGoogle Scholar
7. Porto, S. P. and Krishnan, R. S., J. Chem. Phys. 47, 1009 (1967).Google Scholar
8. Jai, W. and Yen, W. M., J. Raman Spectros. 20, 785 (1989).Google Scholar